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بین المللی علوم (منتشر نمی شود)
مقاله 2، دوره 1، شماره 0 - شماره پیاپی 1351، فروردین 1379 اصل مقاله (762.29 K)
نویسنده
M. KHORASSANI^*
عنوان مقاله [English]
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چکیده [English]
In an inductively coupled R.F plasma reactor, the plasma density increases smoothly for low increase of input power, but exhibits discontinuities or jumps. Variation of plasma temperature and density has been studied by using both single and double Langmuir probes. Other measurements showed that there is smooth increase in the plasma density, by increasing magnetic coil current and the R.F power. Measurements have also confirmed earlier observations that the higher R.F power strongly depends on, to the higher chamber pressure and plasma potential.
کلیدواژه‌ها [English]
Confined Plasma, Probe Diagnostics, R.F Plasma Source

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